![class 100](/sites/default/files/2019-04/class100_0.jpg)
Class 100 Cleanroom
The cleanroom provides an effective environment for photolithography processes and other experiments in which dust particles may affect quality of processed or measured samples.
![mask aligner](/sites/default/files/2019-04/mask-aligner.jpg)
Mask Aligner and UV Exposure Station
Photolithography equipment used for fabrication of micron sized patterns on photoresist.
![spin coater](/sites/default/files/2019-04/spin-coater.jpg)
Spin-Coater/Hotplate System
This benchtop spin-coater and hotplate system can be readily used for the routine fabrication of thin film patterns.
![ion milling](/sites/default/files/2019-04/ion-milling.jpg)
Ion Milling
This dry etching method can be routinely used for creating thin film patterns down to the nanoscale.